GRISH Polishing Slurry
GRISH Polishing Slurry is including PCD polishing slurry, RCD polishing slurry, and CMP polishing slurry which suit for most different applications.
GRISH Polycrystalline Diamond polishing slurry（PCD polishing slurry）
Our most popular PCD polishing slurry can provide high stock removal rate without scratches, widely used for the lapping and processing of sapphire substrate, optic lens, hard glasses, crystals, ceramics, magnetic heads, hard disk and CMOS chip etc.
Specifications
| Grit Size (um) | Oil Base | Water Base | Grit Size (um) | Oil Base | Water Base |
| 1/20 | PC-N50-O | PC-N50-W | 1 | PC-1-O | PC-1-W |
| 1/10 | PC-N100-O | PC-N100-W | 2 | PC-2-O | PC-2-W |
| 1/5 | PC-N200-O | PC-N200-W | 3 | PC-3-O | PC-3-W |
| 1/4 | PC-N250-O | PC-N250-W | 4 | PC-4-O | PC-4-W |
| 1/2 | PC-N500-O | PC-N500-W | 6 | PC-6-O | PC-6-W |
GRISH RCD Polishing Slurry
RCD polishing slurry takes GRISH own RCD powder as raw materials. With polydisperse formula, it can keep high and uniform removal rate and not easy to produce scratches.
Specifications
| Grit Size (μm) | Water Based | Oil Based | Applications |
| 3 | RC-3-W | RC-3-O | Polishing of Sapphire,Hard Glass, Etc. |
| 4 | RC-4-W | RC-4-O | |
| 5 | RC-5-W | RC-5-O | |
| 10 | RC-10-W | RC-10-O | Using with polishing pad, alternative solution to sapphire polishing |
| 17 | RC-17-W | RC-17-O |
GRISH CMP Slurry
GRISH CMP Slurry for Sapphire takes colloidal as raw material, which has a unique formula design according to different polishing materials.
Specifications
| Items | SO-80-PF | SO-100-PF | Test Method |
| Particle Size (nm) | 70-90 | 90-110 | Laser Particle Analyzer |
| Particle Deature | Sphere | Sphere | SEM /TEM |
| pH | 10.5±0.5 | 10.5±0.5 | pH Meter |
| Viscosity (cps) | ＜10 | Viscometer | |
| Package | 500ml, 25Kg, 200Kg | ||
