CMP Slurry

CMP Slurry takes colloidal as raw material. With unique formulas design according to different polishing materials, our slurry can ensure the pH value almost unchanged during polishing, thus to  ensure the stability of polishing rate and save polishing time. GRISH CMP polishing slurry is  widely used for variety of nanscale material's chemical mechanical polishing. Such as sapphire material, silicon, stainless steel, aluminum magnesium alloy, compound crystal, etc.